オニウム塩、ネガ型レジスト組成物及びレジストパターン形成方法

Title:

オニウム塩、ネガ型レジスト組成物及びレジストパターン形成方法

Document Type and Number:

Japanese Patent JP7099250

Kind Code:

B2

Abstract:

A negative resist composition comprising an onium salt having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.

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Inventors:

General Domon
Naoya Inoue
Masaki Ohashi
Keiichi Masunaga
Masaaki Kotake

Application Number:

JP2018200797A

Publication Date:

July 12, 2022

Filing Date:

October 25, 2018

Export Citation:

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Assignee:

Shin-Etsu Chemical Co., Ltd.

International Classes:

C07C311/48; C07C381/12; C08F12/24; C08F20/30; G03F7/004; G03F7/038; G03F7/20

Domestic Patent References:

JP2011203644A
JP2017016068A
JP2009251037A
JP2016210761A
JP2017132827A

Attorney, Agent or Firm:

Hideaki International Patent Office

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