Title:
光導波路およびその製造方法
Document Type and Number:
Japanese Patent JP4997396
Kind Code:
B2
Inventors:
Hirotaka Mochizuki
Mizoguro Toshiko
Nobutaka Tanigaki
Mizoguro Toshiko
Nobutaka Tanigaki
Application Number:
JP2006065628A
Publication Date:
August 08, 2012
Filing Date:
March 10, 2006
Export Citation:
Assignee:
National Institute of Advanced Industrial Science and Technology
International Classes:
G02B6/122; G02B6/12; G02B6/13
Domestic Patent References:
| JP60188906A | ||||
| JP4251804A | ||||
| JP61156007A | ||||
| JP4250403A |
Other References:
望月博孝ほか,「蒸気浸透による高分子光導波路の作成」,信学技報,2004年6月,OME104(136),p.29-p.33
Attorney, Agent or Firm:
Patent Business Corporation Saegusa International Patent Office