To provide an oxide sintered compact which is substantially composed of tin, zinc and oxygen, to provide a target for sputtering or ion plating which dose not occur crack even if high DC power is applied, to provide an oxide transparent conductive film which is excellent in chemical resistance and has an amorphous structure, and to provide a manufacturing method which can form the oxide transparent film at high speed in high productivity.

The oxide sintered compact, which is substantially composed of tin, zinc and oxygen, contains zinc so that the ratio Zn/(Zn+Sn) of the number of atoms is 0.05-0.48, and is mainly composed of a zinc stannate compound phase and a tin oxide phase. The target is obtained by processing the oxide sintered compact. The transparent conductive film is formed on a substrate by using the target by a sputtering or ion plating process.

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