Title:
PATTERN DUPLICATOR AND MANUFACTURING METHOD OF SUBSTRATE
Document Type and Number:
Japanese Patent JP2020197608
Kind Code:
A
Abstract:
To provide a pattern duplication method and a manufacturing method of a substrate, which can suppress manufacture of a substrate having a defect even when the defect occurs in a duplication original plate.SOLUTION: A pattern duplicator 1 comprises: a substrate holding part 10 for holding a substrate 12; a transfer part 30 for transferring a pattern on the substrate using an active duplication original plate 20a; a substrate detection camera 11 capable of imaging the substrate after pattern transfer; an exchange mechanism for exchanging the active duplication original plate with a reserved duplication original plate; and a controller 40, in which the controller extracts defect information in the pattern transferred on the plurality of substrates, based on image data of the substrate imaged by the substrate detection camera, when the defect information coincides between the plurality of substrates, the exchange mechanism is controlled to exchange the active duplication original plate with the reserved duplication original plate.SELECTED DRAWING: Figure 1
Inventors:
AKAO SOSUKE
KONDO HITOSHI
KONDO HITOSHI
Application Number:
JP2019103143A
Publication Date:
December 10, 2020
Filing Date:
May 31, 2019
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
RICOH CO LTD
RICOH CO LTD
International Classes:
G03F7/20; B41F33/00; B41M1/34; G01N21/956; G03F1/84
Attorney, Agent or Firm:
Patent Business Corporation Daiichi International Patent Office