To provide a pattern forming material capable of forming an image by UV exposure, having satisfactory lamination and handling properties, superior storage stability, having superior chemical resistance, surface hardness, heat resistance, and so forth after the exposure, and capable of forming a high definition permanent pattern, and to provide a pattern forming device provided with the pattern forming material, and a permanent pattern forming method using the pattern forming material.
The pattern forming material includes a support and at least a photosensitive layer on the support. The photosensitive layer includes at least a binder, a polymerizable compound, a photopolymerization initiator, and a thermal crosslinking agent. The thermal crosslinking agent includes a compound having a specific structure. When exposing and developing the photosensitive layer, the minimum energy of the light to be used in the exposure is 0.1-200 mJ/cm2, which does not change the thickness of the exposed part of the photosensitive layer after the exposure and the development.
TAKAYANAGI TAKASHI
Yoshihiro Nagare
Naoko Matsuda