To provide a photosensitive composition excellent in base peeling property, having small surface tackiness, high suitability to production, good laminating property and good handleability, capable of exhibiting excellent chemical and heat resistances after development, and capable of satisfying both surface hardness and brittleness, a photosensitive film obtained by using the composition, a high-definition permanent pattern and an efficient method for forming the pattern.
The photosensitive composition contains at least a binder, a polymerizable compound, a photopolymerization initiator and a thermal crosslinking agent, wherein the binder contains at least one or more epoxy acrylate compounds and one or more copolymers including at least a repeating unit having a carboxyl group and a repeating unit having an alkenyl group. The photosensitive film obtained by using the composition, the permanent pattern and the method for forming the pattern are also provided.
TAKAYANAGI TAKASHI
Yoshihiro Nagare
Naoko Matsuda