Title:
PATTERN FORMING METHOD, COLOR FILTER AND LIQUID CRYSTAL DISPLAY
Document Type and Number:
Japanese Patent JP2007101742
Kind Code:
A
Abstract:
To provide a pattern forming method with which a pattern of proper profile can be formed.
The pattern forming method for forming a pattern of a color filter member includes at least a photosensitive resin layer forming step of forming a photosensitive resin layer comprising a photosensitive resin composition on a substrate; a pattern exposure step of forming a two-dimensional image by exposing the photosensitive resin layer by relative scanning, while modulating light based on image data; and a development step of developing the exposed photosensitive resin layer, wherein γ of the photosensitive resin layer is 1-15 and the extinction ratio of an exposure device used for the pattern exposure is ≤10%.
Inventors:
SERIZAWA SHINICHIRO
SUMI KATSUTO
SATO MORIMASA
SUMI KATSUTO
SATO MORIMASA
Application Number:
JP2005289309A
Publication Date:
April 19, 2007
Filing Date:
September 30, 2005
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
G02B5/20; G02F1/1335; G03F7/004
Domestic Patent References:
| JP2005249970A | 2005-09-15 | |||
| JP2004343003A | 2004-12-02 | |||
| JPH11160516A | 1999-06-18 |
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda