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Title:
PHOTO-SETTING RESIN COMPOSITION AND COATING MATERIAL
Document Type and Number:
Japanese Patent JP3565240
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To obtain a photo-setting resin composition and coating material excellent in smoothness and close adhesion of a coated film on applying the same to a plastic or a processed wood material, not having a tacky feeling at a surface of the coated film, and capable of obtaining a good degree of elongation and braking strength.
SOLUTION: The photo-setting resin composition and coating material contains (A) a urethane compound having unsaturated groups at both terminals and obtained by reacting (a) an isocyanate compound having two isocyanate groups in a molecule, (b) a polyoxytetramethylene glycol compound having 300-1300 molecular weight, (c) a glycol compound as a polyoxyethylene polypropylenealkyl ether type having 500-2500 averaged molecular weight and expressed by the formula [(a), (c) are each ≥1 integer; (b) is 15-25 integer; (a+c) is 15-25], (d) a glycol compound expressed by the formula: HO(C2H4O)eH [(e) is 1-3 integer] and (e) an unsaturated compound containing hydroxyl group, and (B) a photopolymerization initiator.


Inventors:
Keiji Hamada
Kenichi Oyasu
Takashi Amano
Application Number:
JP28540196A
Publication Date:
September 15, 2004
Filing Date:
October 28, 1996
Export Citation:
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Assignee:
Hitachi Chemical Co., Ltd.
International Classes:
C08F290/06; C08G18/67; C09D4/00; C09D4/02; C09D5/00; C09D175/16; (IPC1-7): C08F290/06; C09D4/00; C09D5/00; C09D175/16
Domestic Patent References:
JP8012731A
JP1153710A
JP2011611A
JP8169925A
Attorney, Agent or Firm:
Tetsuo Hotaka