Title:
PHOTOCATALYTIC FILM AND ITS MANUFACTURE
Document Type and Number:
Japanese Patent JP2000033271
Kind Code:
A
Abstract:
To prepare a transparent photocatalytic film which is a plastic film with a photocatalytic layer and is not decomposed or qualitatively deteriorated by a photocatalytic effect when the film is used as a photocatalytic film and to provide a method for manufacturing the photocatalytic film.
This photocatalytic film 10 has an activity shut-off layer 2 consisting of a chemical vapor deposition layer of a silicon oxide with 100-400 thickness and a photocatalytic layer 3 composed mainly of titanium oxide, formed on one of the faces of a base film 1. The activity shut-off layer 2 contains SiOx and at least one or more kinds of chemical compounds of carbon, hydrogen, silicon and oxygen in succession by a chemical vapor deposition process.
Inventors:
YAMADA YASUSHI
Application Number:
JP20476498A
Publication Date:
February 02, 2000
Filing Date:
July 21, 1998
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
B01J35/02; C23C16/30; C23C16/40; C23C16/50; C23C28/04; B32B9/00; (IPC1-7): B01J35/02; B32B9/00; C23C16/30; C23C16/40; C23C16/50; C23C28/04
Attorney, Agent or Firm:
Satoshi Kanayama (1 person outside)
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