Title:
PHOTOCURABLE COMPOSITION
Document Type and Number:
Japanese Patent JP2014156585
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a photocurable composition which has excellent thermal creep resistance, workability, durability, and adhesiveness and which can undergo thick film curing; a cured product of the photocurable composition; and production methods of an optical equipment part containing the cured product, optical equipment, and a display module using the photocurable composition.SOLUTION: The photocurable composition comprises (A) a (meth)acrylic acid ester-based polymer having 0.8 or more silyl groups on average in one molecule, (B) a (meth)acryloyl-based group-containing compound having a (meth)acryloyl-based group represented by the following general formula (1); (C) a curing accelerator; (F) a photo-radical initiator; and (I) a resin filler having an average particle diameter of 1 to 150 μm. -OC(O)C(R)=CH(1) (In the formula (1), Rrepresents a hydrogen atom or an organic group having 1 to 20 carbon atoms.)
Inventors:
YAMAYA HIROSHI
OKAMURA NAOMI
SAITO ATSUSHI
OKAMURA NAOMI
SAITO ATSUSHI
Application Number:
JP2013248292A
Publication Date:
August 28, 2014
Filing Date:
November 29, 2013
Export Citation:
Assignee:
CEMEDINE CO LTD
International Classes:
C08F2/50; C08F2/44; C09J11/04; C09J11/06; C09J11/08; C09J133/04; C09J133/06; C09J143/02; C09K3/10; G02F1/1335
Domestic Patent References:
| JP2012136685A | 2012-07-19 |
Foreign References:
| WO2008041768A1 | 2008-04-10 | |||
| US20120270961A1 | 2012-10-25 |
Attorney, Agent or Firm:
Shinsuke Ishihara
Ishihara Sho 2
Ishihara Sho 2
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