PURPOSE: To obtain a photomask having a high adhesion strength between a metal and a base plate, while it has a fine pattern, and excellent in a condition on the base plate by forming an etching blocking layer, a light shielding film layer and an antireflection layer successively on the transparent base plate.

CONSTITUTION: In order to increase the adhesion strength and reduce the glass damage by using a high m.p. metal, for example Ta and Mo capable of conducting a high speed etching with a dry etching with a fluorine series gas, a means inserting a chrome oxide or nitride layer remarkably enhanced the light transmissivity on the transparent base 4 is used, and 3 layers of the etching blocking layer 1, the light shielding layer 2, and the antireflection layer 3 are successively laminated in this order. Thus a photomask capable of conducting a fine processing without damaging an adhesion strength to the base plate, and the condition of the base plate is obtained.