Title:
SPUTTERING FILM DEPOSITION EQUIMENT, AND FABRICATION OF PHOTOMASK BLANK USING THE SAME
Document Type and Number:
Japanese Patent JP3900758
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide film deposition equipment causing no fluctuation in the degree of vacuum during film deposition in a film deposition chamber and also to provide a method of fabrication for photomask blanks minimal in dispersion of optical properties using the film deposition equipment.
SOLUTION: Sputtering film deposition equipment 10 is provided with a cover 9 for regulation of gas passage in a film deposition chamber 2. This cover is constituted so that it covers a gas introducing hole 7 and a vacuum exhaust system 8 and has an opening above a target 5. Owing to this constitution, fluctuations in the degree of vacuum (gas pressure) in the vicinity of the target 5 in the film deposition chamber 2 can be prevented even if a tray on which a glass substrate is mounted is absent in some places. As a result, the photomask blanks fabricated by using this equipment can reduce dispersion in optical properties, such as optical concentration and reflectivity.
Inventors:
Akio Kuroda
Toyoaki Shimizu
Toyoaki Shimizu
Application Number:
JP28126499A
Publication Date:
April 04, 2007
Filing Date:
October 01, 1999
Export Citation:
Assignee:
Toppan Printing Co., Ltd.
International Classes:
C23C14/34; H01L21/027; G03F1/50; G03F1/54; (IPC1-7): C23C14/34; G03F1/08; H01L21/027
Domestic Patent References:
| JP1125357U | ||||
| JP8165573A | ||||
| JP5297570A | ||||
| JP2000098582A |