To provide a method for forming a spacer, a sub-spacer and a rib of a color filter by one step of photolithography so that each of them has a high quality.
The photomask 1 has a light shielding pattern 12, a halftone pattern 13 and another light shielding pattern 14 having another halftone pattern 15 on the periphery thereof on a substrate 11. An original color filter 2 obtained by applying a positive photoresist 16 to a substrate 23 is exposed through the photomask 1 and the exposed original color filter is developed to obtain an intermediate color filter 3. The intermediate color filter 3 has the spacer 17 formed correspondingly to the light shielding pattern 12, the rib 19 formed correspondingly to the halftone pattern 13 and the sub-spacer 21 formed according to the light shielding pattern 14 and the halftone pattern 15. The sub-spacer 21 has a high central part and a low peripheral part. When the intermediate color filter 3 is baked, the color filter 4 having the spacer 29, the sub-spacer 33 and the rib 31 are provided.
SAIJO HIROKAZU
YANO TETSURO
| JP2000075305A | 2000-03-14 | |||
| JP2008046623A | 2008-02-28 | |||
| JP2003207788A | 2003-07-25 |
| WO2006064905A1 | 2006-06-22 |
Next Patent: LENS DEVICE AND IMAGING APPARATUS