Title:
フォトマスクのパターン検査方法、フォトマスクのパターン検査装置、およびフォトマスクのパターン検査プログラム
Document Type and Number:
Japanese Patent JP4091605
Kind Code:
B2
Abstract:
An image of an inspection object pattern formed on a photomask is acquired, which is to be transformed into inspection object pattern data as input data of light intensity distribution simulation for finding light intensity distribution in which optical conditions of an exposure system used in pattern transfer are reflected. The light intensity distribution simulation is performed using the inspection object pattern data, and a difference between light intensity distribution of the inspection object pattern obtained by the light intensity distribution simulation and reference light intensity distribution is found. Inverse light intensity distribution simulation having reversibility to the light intensity distribution simulation is performed using the difference, to obtain difference pattern data determining a defect in the inspection object pattern. Consequently, the presence/absence of the defect in the inspection object pattern can be determined highly accurately and defect location in the inspection object pattern can be identified easily and certainly.
Inventors:
Satoshi Akutagawa
Kazuhiko Takahashi
Kazuhiko Takahashi
Application Number:
JP2004570156A
Publication Date:
May 28, 2008
Filing Date:
March 31, 2003
Export Citation:
Assignee:
富士通株式会社
International Classes:
G01N21/956; G03F1/36; G03F1/84; G06K9/00; G06T1/00; G06T7/00; H01L21/027
Domestic Patent References:
| JP2000147748A | ||||
| JP9297109A | ||||
| JP10293393A | ||||
| JP6167458A | ||||
| JP4177111A | ||||
| JP2238313A |
Foreign References:
| US3787117 |
Attorney, Agent or Firm:
Furuya Fumio