To obtain a photoresist composition excellent in smoothness, stain- proof, durability, etc., of a coating film and useful for a coating material by including a specific acrylic resin, a photoinitiator, etc.
This composition comprises (A) an acrylic resin having an unsaturated double bond capable of photocuring on its side chain, (B) a compound (e.g. a bifunctional silicone acrylate or the like) having an organic polysiloxane structure and at least one unsaturated double bond capable of photocuring in one molecule and (C) a photoinitiator such as 2-hydroxy-2- methyl-1-phenylpropan-1-one preferably in respective amounts of 80-95 wt.%, 5-20 wt.% and 3-7 pts.wt. based on the total of the ingredients A and B. The ingredient A is preferably a resin obtained by reacting (meth)acrylic acid with a prepolymer which is obtained by copolymerizing a glycidyl (meth)acrylate with an unsaturated compound (e.g. methyl methacrylate or the like) having one polymerizable unsaturated bond in one molecule.
OYASU KENICHI
KONDO SHUICHI
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