PHOTORESIST MONOMER AND ITS PRODUCTION, PHOTORESIST COPOLYMER, PHOTORESIST COMPOSITION, FORMATION OF PHOTORESIST PATTERN AND SEMICONDUCTOR ELEMENT

Japanese Patent JP3646020

B2

PROBLEM TO BE SOLVED: To provide a new compound that bears one or more carboxylic acid an butyl groups and can readily produce a large amount of photoresist resins for electron beams and X-rays in low costs.
SOLUTION: This new compound is represented by formula I (R1 and R2 are each H, t-butyl; X is hydrogen, hydroxy, oxygen; n is 1-3), typically 5- norbornene-2-carbony-di-t-butyl malonate. The compound of formula I is prepared by allowing a compound of formula II (R3 is a halogen as chlorine, bromone, iodine or the like or H) to react with a malonic salt of formula III (R4 and R5 are each t-butyl or sodium ion) in a solvent, acidifying the remaining solution after the solvent distillation from the reaction mixture and separating and purifying the organic layer. An example of malonic acid salt of formula III is the sodium salt of di-t-butyl malonate of formula IV.

WO/1998/056500	USE OF CHROMIUM (III) CARBOXYLATES AS A CATALYST
WO/2008/119196	OFF-NOTE BLOCKING SENSORY ORGANIC COMPOUNDS
JP2826830	[Title of Invention] A novel norbornene derivative, a method for producing the same, and a cosmetic and pharmaceutical composition containing the same.

Lee Nemori
Choru Kei
Chung Zhao Chang
White base ho
Chung Min Ho

JP12537999A

May 11, 2005

April 30, 1999

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HYNIX SEMICONDUCTOR INC.

C07C57/26; C07C59/46; C07C59/80; C07C69/608; C07C69/732; C07C69/738; C08F22/06; C08F32/00; C08G61/08; G03F7/027; G03F7/039; G03F7/004; (IPC1-7): C08F22/06; C07C69/608; C08F32/00; G03F7/027

JP11310611A
JP10010739A
JP10316720A
JP2146045A

Hiroshi Arafune
Yoshio Arafune

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