Title:
PHOTOSENSITIVE COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM AND PATTERNED CURED FILM
Document Type and Number:
Japanese Patent JP2021167906
Kind Code:
A
Abstract:
To provide: a photosensitive composition which gives a cured product having a low relative dielectric constant and can form a coating film having good conformability on a stepped substrate; a cured product of the photosensitive composition; and a method for producing a cured product using the photosensitive composition.SOLUTION: There is provided a photosensitive composition which comprises an alkali-soluble resin (A), a photopolymerizable compound (B) and a photopolymerization initiator (C), wherein an acrylic resin containing a structural unit (A-1) derived from a polycycloalkyl (meth)acrylate in a specific amount and having a weight average molecular weight of 90000 or more as the alkali-soluble resin (A).SELECTED DRAWING: None
Inventors:
KATO HIROKI
SOMEYA KAZUYA
HIKITA JIRO
SOMEYA KAZUYA
HIKITA JIRO
Application Number:
JP2020071282A
Publication Date:
October 21, 2021
Filing Date:
April 10, 2020
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/004; G03F7/027; G03F7/031; G03F7/20
Domestic Patent References:
| JP2018506532A | 2018-03-08 | |||
| JP2016519675A | 2016-07-07 | |||
| JP2018151489A | 2018-09-27 | |||
| JP2012173678A | 2012-09-10 | |||
| JP2018004841A | 2018-01-11 | |||
| JP2011232659A | 2011-11-17 | |||
| JP2011253110A | 2011-12-15 | |||
| JP2012008537A | 2012-01-12 | |||
| JP2013041153A | 2013-02-28 | |||
| JP2018151490A | 2018-09-27 |
Foreign References:
| KR20190129717A | 2019-11-20 | |||
| WO2018021184A1 | 2018-02-01 |
Attorney, Agent or Firm:
Masayuki Masabayashi
Hayashi Ichiyoshi
Hayashi Ichiyoshi