Title:
PHOTOSENSITIVE FILM UTILIZING PHOTOSENSITIVE FILM FORMING COPOLYMER AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JP3269796
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To easily carry out a lithographic process utilizing far UV and to form a fine pattern fit to highly integrate a semiconductor device by polymerizing plural kinds of specified alicyclic olefins.
SOLUTION: Two or more kinds of alicyclic olefins selected from among 2-cyclopentene-1-acetic acid, 2-cyclopentene-1-(t-butyl acetate), bicyclo[2,2,2,]oct-5- ene-2-t-butyl carboxylate, cyclopentene, cyclohexene, norbonylene, norbonylene-2- methanol, etc., are poured into an autoclave, an initiator is added and the autoclave is filled with an atmosphere of gaseous N2 or Ar. The alicyclic olefins are brought into reaction at a high temp. of about 60-200°C under a high pressure of 50-200atm to produce the objective photosensitive film forming copolymer for far UV.
Inventors:
Chung
ト ▲チェオル▼ 圭
White base
ト ▲チェオル▼ 圭
White base
Application Number:
JP35313197A
Publication Date:
April 02, 2002
Filing Date:
December 22, 1997
Export Citation:
Assignee:
HYNIX SEMICONDUCTOR INC.
International Classes:
C08F2/48; C08F32/00; C08F232/00; C08F232/08; G03F7/039; H01L21/027; G03F7/004; (IPC1-7): C08F232/00; G03F7/039; H01L21/027
Other References:
【文献】国際公開97/33198(WO,A1)
Attorney, Agent or Firm:
Yoshiki Hasegawa (4 outside)
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