Title:
PHOTOSENSITIVE LITHOCHOLATE ESTER DERIVATIVE AND CHEMICALLY AMPLIFYING TYPE PHOTORESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP3824131
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a photosensitive compound capable of maintaining a transparent property even under an exposure light source having ≤193 nm short wave length, excellent in adhering capability to a base plate and not only excellent in wettability toward a developing liquid but also in resistance to dry etching, and a chemically amplifying type photoresist composition.
SOLUTION: This photosensitive compound is a photosensitive lithocholate ester derivative provided with carboxyl group blocked by a blocking group which can be de-blocked by an acid, of which hydroxyl group at the 3-position is substituted by a hydrophilic aliphatic compound or a hydrophilic alicyclic compound.
Inventors:
Kim wise friend
Lee Shu
Common sense
Lee Shu
Common sense
Application Number:
JP2000280371A
Publication Date:
September 20, 2006
Filing Date:
September 14, 2000
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
C07J9/00; C07J1/00; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): C07J9/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP8092276A |
Other References:
Steroids,1996, Vol.61, No.11,pp.664-669
Tetrahedron Letters,1992, Vol.33, No.30,pp.4329-32
Tetrahedron Letters,1992, Vol.33, No.30,pp.4329-32
Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani