To prevent the damage and the developing irregularity of a photosensitive material from occurring because it is brought into contact with a cover by passing it through the passing hole of the cover without bringing it into contact with the cover even when the aperture area of the passing hole is small and to suppress processing solution to be brought into contact with the atmosphere through the passing hole to the utmost by reducing the aperture area of the passing hole.
A film is carried to the upper part from the side part of a developing tank 10, bent downward by a guide roller 26 and carried downward by a guide roller pair 28. Then, it is passed through the passing hole 66 of the cover 64 and it enters developing solution. Besides, it is passed through a first in-liquid roller pair 30 and the other in-liquid roller pairs 32 and 34 succeeding from the roller pair 30, immersed in the developing solution and carried. The cover 64 is fixed to a developing rack 18 supporting the roller pairs 30, 32 and 34 and maintained so as to be brought into contact with the developer solution. The passing posture of the film is always fixed at the hole 66 and the film is passed through the hole 66 while being kept in an identical plane surface. As the result, the passing position of the film is stabilized.
| JP2005031573 | PROCESSING APPARATUS |
IKEDA ATSUSHI
NOZAWA YOSHIE
YAMAMOTO TAKERO
