To obtain a photosensitive material for light surface relief formation which has high sensitivity for more improving relief formation efficiency, forms a relief having thermal stability and stability with time and has chemical stability to various organic solvents and a photosensitive thin film and to provide a method for pattern formation using the photosensitive material.
This azobenzene derivative is represented by general formula (1) (R1 is one kind selected from an alkyl group, an alkoxy group, a halogenated alkyl group and a halogenated alkoxy group; R2 and R3 are each H or an alkyl group; n is an integer of ≥1; x is a number satisfying 0<x<1). This method for relief formation comprises forming a photosensitive thin film by spin coating method or LB method, irradiating the thin film with light rays including light ray at 365 nm wavelength to form a chemical structure of cis form and irradiating the thin film with fixed light rays.
ICHIMURA KUNIHIRO
ZETTSU NOBUYUKI
UBUKATA TAKASHI
