PHOTOSENSITIVE RESIN COMPOSITION, ELECTRODE STRUCTURE, AND METHOD FOR MANUFACTURING THE SAME

Japanese Patent JP2015184630

A

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition from which a favorable electrode structure can be formed, capable of reducing luminous foreign substances on a pattern and avoiding failures by erroneous recognition in an appearance inspection process in the manufacture of a display panel, and an electrode structure for a display panel obtained by applying and curing the photosensitive resin composition.SOLUTION: The photosensitive resin composition of the present invention comprises (A) a carboxyl group-containing resin, (B) metal powder, and (C) a photosensitive organic component. A dispersion degree of the composition, measured in accordance with JIS K5101 and JIS K5600 by use of a 50 μm grind gauge, is less than 10 μm by a streak line method and less than 12.5 μm by a granule method.

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JP2003142801	ETCHING RESIST INK

ITO HIDEYUKI
TAKIZAWA MASAHIRO
KASAMA MICHIKO

JP2014063531A

October 22, 2015

March 26, 2014

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TAIYO INK MFG CO LTD

G03F7/004

JP2005325148A	2005-11-24
JP2006147621A	2006-06-08
JP2000228113A	2000-08-15
JP2006045324A	2006-02-16
JP2006219660A	2006-08-24
JP2006233031A	2006-09-07

Amagi International Patent Office

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