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Title:
PHOTOSENSITIVE RESIN AND RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2009155360
Kind Code:
A
Abstract:

To provide a photosensitive resin composition which is excellent in basic properties such as developability and curability and is also excellent in both uncured film properties (tack-free properties, developability) and cured film physical properties (water resistance, flex resistance).

An epoxy resin, a phenol compound having an alcoholic hydroxy group, and an unsaturated monobasic acid are allowed to react with each other to obtain a curable resin, which is allowed to react with a polybasic acid anhydride to obtain a photosensitive resin. The photosensitive resin is obtained by using a difunctional epoxy resin as the epoxy resin and using a polybasic acid anhydride having a plurality of acid anhydride groups in a molecule as at least part of the polybasic acid anhydride. The photosensitive resin composition comprises the photosensitive resin and a photopolymerization initiator.


Inventors:
OTSUKI NOBUAKI
Application Number:
JP2007331393A
Publication Date:
July 16, 2009
Filing Date:
December 25, 2007
Export Citation:
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Assignee:
NIPPON CATALYTIC CHEM IND
International Classes:
C08G59/14; C08F290/06; G03F7/027



 
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