To provide a photosetting resin composition most suitable as a coating material and an overprint varnish, having excellent adhesion to an oxidation polymerization offset ink and giving a coating film having excellent smoothness, chemical resistance, resistance to the staining with felt-tipped marker and water repellency, a coating material having excellent adhesion to an oxidation polymerization offset ink and giving a coating film having excellent smoothness, chemical resistance, resistance to the staining with felt-tipped marker and water repellency and an overprint varnish having excellent adhesion to an oxidation polymerization offset ink and giving a coating film having excellent smoothness, chemical resistance, resistance to the staining with felt-tipped marker and water repellency.
The photosetting resin composition contains (A) an acrylic resin having photosetting unsaturated double bond on the side chain, (B) a compound expressed by general formula (I) and (C) a photopolymerization initiator, the coating material contains the photosetting resin composition and the overprint varnish contains the photosetting resin composition.
OYASU KENICHI
KONDO SHUICHI
SUGAWARA ATSUSHI
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