Title:
POLYMER AND PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2001323031
Kind Code:
A
Abstract:
To provide a photoresist composition capable of forming an image with light having short wavelength, containing a resin binder having decreased swelling tendency and exhibiting excellent adhesion to the substrate compared with conventional photoresist composition.
The present invention relates to a polymer containing polymerization unit comprising one or more cyclic olefin monomers having one or more pendant cyclic electron-attracting groups, a method for the production of the polymer, a photoresist composition containing the polymer as a resin binder and a method for forming a relief image by using the photoresist composition.
Inventors:
ZAMPINI ANTHONY
BARCLAY GEORGE G
BARCLAY GEORGE G
Application Number:
JP2001050207A
Publication Date:
November 20, 2001
Filing Date:
February 26, 2001
Export Citation:
Assignee:
SHIPLEY CO LLC
International Classes:
G03F7/027; C08F4/26; C08F4/28; C08F32/08; C08F232/04; C08K5/00; C08L45/00; G03F7/039; H01L21/027; G03F7/004; (IPC1-7): C08F232/04; C08F4/26; C08F4/28; C08K5/00; C08L45/00; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Minoru Senda (2 outside)