Title:
PLANT PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2009057313
Kind Code:
A
Abstract:
To provide a plant processing method which enables further improvement on the prevention of deterioration and the long-term storability of a plant.
The plant processing method comprises forming a film of a liquid polysilazane-containing coating material on the surface of a plant base material and converting the polysilazane to silica, to form a coating layer. The plant processing method further comprises forming a film of a liquid polysilazane-containing coating material on the surface of a plant base material, converting the polysilazane to silica, to form a primary coating layer, and forming a secondary coating layer of an organic material on the primary coating layer.
Inventors:
ITO TAKUMA
EBINA TAKEO
EBINA TAKEO
Application Number:
JP2007225263A
Publication Date:
March 19, 2009
Filing Date:
August 31, 2007
Export Citation:
Assignee:
CORONET KK
NAT INST OF ADV IND & TECHNOL
NAT INST OF ADV IND & TECHNOL
International Classes:
A01N3/00
Domestic Patent References:
JP2006206453A | 2006-08-10 | |||
JP2003170060A | 2003-06-17 | |||
JPH0967202A | 1997-03-11 |
Attorney, Agent or Firm:
Kenji Kuroda
Takashi Matsumoto
Takashi Matsumoto
Previous Patent: ANTIOXIDANT AND COSMETIC CONTAINING THE SAME
Next Patent: HOLLOW SILICONE-BASED FINE PARTICLE-CONTAINING COSMETIC
Next Patent: HOLLOW SILICONE-BASED FINE PARTICLE-CONTAINING COSMETIC