Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
Japanese Patent JPS6167227
Kind Code:
A
Abstract:
PURPOSE:To reduce heterogeneity and dispersion of a plasma treatment such as plasma etching by monitoring automatically a plasma luminous intensity. CONSTITUTION:Through an observation port provided in a plasma processing chamber 1, a plasma luminosity is received by a photo sensor 11, which incessantly measures a plasma luminous intensity. A luminous quantity which the photo sensor 11 detects is compared with a constant value and is output in the measuring portion 10. When a discharge becomes weaker than a constant value, an alarm is raised automatically and the first aid such that an output is strengthened according to that is planed to be given.
Inventors:
HOSHINO EIICHI
Application Number:
JP18844884A
Publication Date:
April 07, 1986
Filing Date:
September 07, 1984
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
H01L21/302; H01L21/3065; (IPC1-7): H01L21/302
Domestic Patent References:
| JPS58140125A | 1983-08-19 | |||
| JP57194050B | ||||
| JPS54145947A | 1979-11-14 |
Attorney, Agent or Firm:
Sadaichi Igita