プラズマ処理装置

Japanese Patent JP7303980

B2

To provide a plasma processing apparatus that suppresses damage to a dielectric window during vacuum processing and efficiently supplies a high-frequency magnetic field generated from an antenna to a processing chamber.SOLUTION: A plasma processing apparatus that vacuum-treats an object to be processed placed in a processing chamber using plasma includes a container body having an opening 211 in a wall forming the processing chamber, a metal plate 221 provided so as to close the opening 211 and having a slit penetrating in a thickness direction, a dielectric plate 222 that is in contact with and supported by the metal plate 221 and closes the slit from the outside of the processing chamber, and an antenna 31 provided outside the processing chamber so as to face the metal plate 221 and connected to a high-frequency power source to generate a high-frequency magnetic field, and the dielectric plate 222 is a laminate of an inorganic layer made of an inorganic material and an organic layer made of an organic material, or includes a fiber reinforced material obtained by impregnating the inorganic fiber with the organic material.SELECTED DRAWING: Figure 3

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JP4716979	Cooled vapor deposition baffles in high density plasma semiconductor processes

Yasunori Ando

JP2019127897A

July 06, 2023

July 09, 2019

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Nissin Electric Co., Ltd.

H05H1/46; C23C16/505; H01L21/3065; H01L21/31

JP2008276984A
JP2011258622A
JP2013191593A
JP2020068049A
JP2012133899A
JP2016139592A

KR1020050048421A

Ryuhei Nishimura
Shindai Saito
Yoshinaga Uemura
Atsushi Nakamura
Haruko Maeda

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