PURPOSE: To enable a treatment excellent in uniformity, by arranging magnets so as to obtain a magnetic field distribution satisfying the cycrotron resonance condition in the vicinity of the aperture part of a discharge tube, and arranging magnets so as to obtain a magnetic field whose intensity becomes zero in the vicinity of the surface of an object to be processed.
CONSTITUTION: An antenna 12 radiates microwave against a discharge tube 1 contained in a plasma generating chamber 2. A magnetic field generating equipment 4 is arranged so as to generate a magnetic field larger than or equal to 875 gauss in the vicinity of the aperture part of the plasma generating chamber 2. An magnet 9 is arranged on the opposite side of the plasma generating chamber 2 with respect to a plane type object 8 to be processed 8 in the manner in which the magnetic field intensity becomes zero on the surface of the object 8 to be processed. Electron cycrotron resonance plasma is generated in the vicinity of the discharge tube 1, and the magnetic field intensity becomes zero in the vicinity of the surface of the object 8 to be processed. Thereby, the treatment excellent in uniformity is enabled.
SUZUKI NAOKI
YOSHIDA ZENICHI
| JPS6293834A | 1987-04-30 | |||
| JPS6094725A | 1985-05-27 | |||
| JPS61138432A | 1986-06-25 | |||
| JPS6230891A | 1987-02-09 |