Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
POLYACETAL RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2013032453
Kind Code:
A
Abstract:

To provide a polyacetal resin composition largely improved in creep resistance and toughness without impairing advantages of polyacetal resins such as high rigidity and excellent molding processability.

The polyacetal resin composition is prepared by blending, in (A) 100 pts.wt. of a linear polyacetal resin obtained by copolymerizing (a) 100 pts.wt. of 1,3,5-trioxane and (b) 0.1 to 20 pts.wt. of a cyclic ether compound, (B) 0.1 to 10 pts.wt. of a branched and/or crosslinked polyacetal resin obtained by copolymerizing (a) 100 pts.wt. of 1,3,5-trioxane, (b) 8 to 20 pts.wt. of a cyclic ether compound, and (c) 0.1 to 1 pt.wt. of a monofunctional and/or polyfunctional glycidyl ether compound, (C) 0.01 to 5 pts.wt. of a hindered phenolic antioxidant, (D) 0.05 to 0.15 pt.wt. of an amine-substituted triazine compound, and (E) 0.10 to 0.20 pt.wt. of an aliphatic compound.


Inventors:
KOBAYASHI DAISUKE
ITO AKIRA
TERAMOTO HIROYUKI
Application Number:
JP2011169668A
Publication Date:
February 14, 2013
Filing Date:
August 02, 2011
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
MITSUBISHI GAS CHEMICAL CO
International Classes:
C08L59/04; C08K5/13; C08K5/20; C08K5/3492



 
Previous Patent: DAMPING COMPOSITION

Next Patent: SHIELDING INK COMPOSITION