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Title:
POLYAMIC ACID AND POLYIMIDE RESIN OBTAINABLE THEREFROM AND UTILIZATION OF THEM TO CIRCUIT SUBSTRATE
Document Type and Number:
Japanese Patent JP2002060490
Kind Code:
A
Abstract:

To obtain a novel polyimide resin having both a low coefficient of linear thermal expansion and a low dielectric constant, and a polyamic acid which gives this polyimide resin.

The polyamic acid can be obtained by reacting an acid anhydride component composed of pyromellitic anhydride and 2,2-bis(3,4- dicarboxyphenyl)hexafluoropropane with an aromatic diamine component of any one of a first aromatic amine component of 2,2'-disubstituted-4,4'- diaminobiphenyls and a second aromatic diamine component to be selected from 2,2-bis(4-aminophenoxyphenyl)propanes, 1,1-bis(4-(4-aminophenoxy)-3-t- butyl-6-methylphenyl)butane, 2,2-bis(3-amino-4-methylphenyl)hexafluoropropane, and α,α'-bis(4-aminophenyl)diisopropyl-benzenes in an organic solvent. The polyimide resin can be obtained by heating a solution of such a polyamic acid.


Inventors:
FUKUOKA TAKAHIRO
MOCHIZUKI SHU
KURATA NAOKI
KANESHIRO NAOTAKA
OMOTE TOSHIHIKO
Application Number:
JP2000267636A
Publication Date:
February 26, 2002
Filing Date:
September 04, 2000
Export Citation:
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Assignee:
NITTO DENKO CORP
International Classes:
B32B15/08; B32B27/34; C08G73/10; H05K1/03; H05K1/05; (IPC1-7): C08G73/10; B32B15/08; B32B27/34; H05K1/03
Attorney, Agent or Firm:
Makino Itsuro