Title:
レジストパターン厚肉化用ポリマー組成物、及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP6757623
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method and a material by which a finer pattern can be formed into a good shape.SOLUTION: A method for forming a resist pattern is provided, which includes the steps of: forming a resist pre-pattern 2 with an acidic group exposed on a surface 2a thereof on a support body 1; forming a polymer film 3 by applying a polymer composition for thickening a resist pattern on the support body 1 where the resist pre-pattern 2 is formed so as to cover the resist pre-pattern 2; forming a developer-insoluble layer 3a on the surface 2a; and developing the resist pre-pattern 2 where the developer-insoluble layer 3a is formed and the polymer film 3 covering the resist pre-pattern 2 to form a resist pattern 4 that is a thickened pattern of the resist pre-pattern 2. The polymer composition for thickening a resist pattern comprises: a resin component having a structural unit derived from a monomer including a basic group; and a basic component having a pKa smaller than the pKa of a conjugate acid of the above monomer and having a logP value of 7.5 or less.SELECTED DRAWING: Figure 1
Inventors:
Sunamichi Tomonari
Emi Uchida
Emi Uchida
Application Number:
JP2016158103A
Publication Date:
September 23, 2020
Filing Date:
August 10, 2016
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/40; C08L101/02; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2016006493A | ||||
| JP2015180920A | ||||
| JP2011524930A | ||||
| JP2016526183A | ||||
| JP2015045836A |
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Matsumoto
Ryu Miyamoto
Masato Iida
Masatake Shiga
Matsumoto
Ryu Miyamoto
Masato Iida