Title:
POLYMER COMPOUND, CHEMICALLY AMPLIFIED RESIST MATERIAL AND METHOD FOR PATTERNING
Document Type and Number:
Japanese Patent JP3835523
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a new polymer compound useful as a base polymer for chemically amplified resist material with excellent transmittance to vacuum UV rays, to obtain a chemically amplified resist material comprising the polymer compound, and to provide a method for patterning using the resist material.
SOLUTION: This polymer compound has a group expressed by the general formula (1) (where R1 represents a fluorine atom or a linear, branched or cyclic fluorized alkyl group having 1 to 20 carbons; R2 represents a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 20 carbons; 1≤k≤5; 0≤k'≤4; and k+k'=5). The resist material senses high energy beam, having excellent sensitivity to a wavelength below 200 nm, especially below 170 nm, and further has improved plasma etching resistance due to introduction of a fluorized aromatic ring together with excellent resolvability.
Inventors:
Yuji Harada
Jun Watanabe
Jun Hatakeyama
Yoshio Kawai
Masako Sasako
Masataka Endo
Kishimura Shinji
Mitsutaka Otani
Satoru Miyazawa
Kentaro Tsutsumi
Kazuhiko Maeda
Jun Watanabe
Jun Hatakeyama
Yoshio Kawai
Masako Sasako
Masataka Endo
Kishimura Shinji
Mitsutaka Otani
Satoru Miyazawa
Kentaro Tsutsumi
Kazuhiko Maeda
Application Number:
JP2000383223A
Publication Date:
October 18, 2006
Filing Date:
December 18, 2000
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
Matsushita Electric Industrial Co., Ltd
Central Glass Co., Ltd.
Matsushita Electric Industrial Co., Ltd
Central Glass Co., Ltd.
International Classes:
G03F7/039; C08F20/22; C08F22/18; C08F22/40; C08F32/00; C08K5/00; C08L101/04; H01L21/027; (IPC1-7): C08F20/22; C08F22/18; C08F22/40; C08F32/00; C08K5/00; C08L101/04; G03F7/039; H01L21/027
Domestic Patent References:
| JP2045509A | ||||
| JP63234006A | ||||
| JP60173004A |
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa