Title:
高分子化合物及びポジ型レジスト材料並びにこれを用いたパターン形成方法
Document Type and Number:
Japanese Patent JP4133376
Kind Code:
B2
Inventors:
Jun Hatakeyama
Tsuyoshi Kanao
Koji Hasegawa
Takeshi Watanabe
Osamu Watanabe
Takanobu Takeda
Tsuyoshi Kanao
Koji Hasegawa
Takeshi Watanabe
Osamu Watanabe
Takanobu Takeda
Application Number:
JP2003020843A
Publication Date:
August 13, 2008
Filing Date:
January 29, 2003
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F232/08; G03F7/039; C08F222/06; C08F222/40; C08F224/00; C08F234/04; H01L21/027
Domestic Patent References:
| JP2002202610A | ||||
| JP2001089538A | ||||
| JP4249509A | ||||
| JP6043646A | ||||
| JP5134413A | ||||
| JP11505877A |
Attorney, Agent or Firm:
Mikio Yoshimiya