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Title:
高分子化合物、レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4831274
Kind Code:
B2
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Inventors:
Tsunehiro Nishi
Mutsuko Nakajima
Seiichiro Tachibana
Tsuyoshi Kanao
Koji Hasegawa
Takeshi Watanabe
Jun Hatakeyama
Application Number:
JP2001123992A
Publication Date:
December 07, 2011
Filing Date:
April 23, 2001
Export Citation:
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Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F232/00; G03F7/039; C08F222/06; C08F222/40; C08K5/00; C08L45/00; H01L21/027
Domestic Patent References:
JP2000109525A
JP2000103819A
JP2001183839A
JP2001228613A
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa



 
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