Title:
POLYMER MADE FROM MONOMER PREPARED BY BONDING CHOLIC ACID, DEOXYCHOLIC ACID, OR LITHOCHOLIC ACID DERIVATIVE TO NORBORNENE AND USE OF SAME
Document Type and Number:
Japanese Patent JP3199712
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a substance which gives a phororesist being capable of transmitting an argon fluoride excimer laser wavelength of a specified value and transparent and having good dry etching resistance by homopolymerizing or copolymerizing a monomer prepared by bonding a cholic acid, deoxycholic acid, or lithocholic acid derivative of an aliphatic polycyclic structure to norbornene with maleic anhydride or the like.
SOLUTION: The laser wavelength is 193 nm. The monomer is represented by the formula (wherein R1 and R2 are each H, methyl substituted on norbornene, OH, CH2OH, CO2CH3, to the like; R3 is (CH2)nO, CO(CH2)nO, or the like; n is 0-3; R4 and R5 are each H, OH, OCOCH3, or the like; and R6 is H, C(CH3)3, tetrahydropyranyl protective group, or the like). This is obtained by converting the acid group of cholic acid or the like into a protective group which leaves when treated with an acid and reacting the converted compound with a norbornene derivative such as 2-chlorocarbonyl-5-norbornene. This monomer is homopolymerized or copolymerized with maleic anhydride or the like to obtain the odjective substance.
Inventors:
Kim Jin Ho
Lee Bum Wook
Lee Bum Wook
Application Number:
JP2000058621A
Publication Date:
August 20, 2001
Filing Date:
March 03, 2000
Export Citation:
Assignee:
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
International Classes:
C07C69/675; C07C69/708; C07C69/753; C08F32/08; C08F222/06; C07C69/73; G03F7/039; G03F7/004; (IPC1-7): C08F32/08; C07C69/675; C07C69/708; C07C69/753; C08F222/06; G03F7/039
Attorney, Agent or Firm:
Kiyoshi Kuzuwa