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Title:
POLYMER, MANUFACTURING METHOD OF IT, RESIST COMPOSITION, AND MANUFACTURING METHOD OF PATTERNED SUBSTRATE
Document Type and Number:
Japanese Patent JP2009029848
Kind Code:
A
Abstract:

To provide a polymer having high sensitivity and high resolution and causing little defect in development when it is used for a resist composition in DUV excimer laser lithography and the like.

The polymer contains at least one constituent selected from a constitutional unit A having an -ester alicyclic skeleton, a constitutional unit B having a lactone skeleton, a constitutional unit C having an acid leaving group, a constitutional unit D having a hydrophilic group, and a constitutional unit E having a naphthalene skeleton.


Inventors:
MOMOSE AKIRA
NODONO MITSUFUMI
Application Number:
JP2007192561A
Publication Date:
February 12, 2009
Filing Date:
July 24, 2007
Export Citation:
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Assignee:
MITSUBISHI RAYON CO
International Classes:
C08F232/00; G03F7/039; H01L21/027
Domestic Patent References:
JP2004359704A2004-12-24
JPH0616730A1994-01-25
JPS52121099A1977-10-12
JP2003307839A2003-10-31
JP2003167333A2003-06-13
JP2007186546A2007-07-26
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu



 
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