Title:
POLYMERIZABLE MONOMER, POLYMER, RESIST MATERIAL USING THE SAME, AND PATTERN FORMATION METHOD THEREFOR
Document Type and Number:
Japanese Patent JP2012031381
Kind Code:
A
Abstract:
To provide a polymerizable monomer for use in a resist, suitable for microfabrication performed by dry exposure, immersion exposure or a double patterning process, and to provide a polymer of the same, a resist material using the same, and a pattern formation method.
This polymerizable monomer contains a repeating unit represented by general formula (6), general formula (7), or general formula (8). (In the formula, R1 represents a hydrogen atom, a halogen atom, a methyl group, or a trifluoromethyl group; R2 represents a methyl group, an ethyl group, or an isopropyl group; and A represents a carbonyl group (C=O) together with a carbon atom bonded thereto, or an acetal structure in which the carbonyl group is protected by a protective group).
Inventors:
SUGAFUJI ARIMASA
OMURO HITOSHI
ISHII SHOKO
TSUNODA SHINICHI
MAEDA KAZUHIKO
OMURO HITOSHI
ISHII SHOKO
TSUNODA SHINICHI
MAEDA KAZUHIKO
Application Number:
JP2011051774A
Publication Date:
February 16, 2012
Filing Date:
March 09, 2011
Export Citation:
Assignee:
CENTRAL GLASS CO LTD
International Classes:
C08F20/26; G03F7/004; G03F7/039; G03F7/40; H01L21/027
Attorney, Agent or Firm:
Makoto Koide
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