Title:
POSITIVE TYPE PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2002351063
Kind Code:
A
Abstract:
To provide a positive type photosensitive composition having high sensitivity and improved edge roughness of a pattern.
The positive type photosensitive composition contains (A) a specified acid generator which generates an acid when irradiated with active light or radiation, (B) a resin which has a mono- or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of the acid to increase its solubility in an alkali developing solution, (C) a specified basic compound and (D) a fluorine- and/or silicon-containing surfactant.
Inventors:
FUJIMORI TORU
KODAMA KUNIHIKO
SATO KENICHIRO
KODAMA KUNIHIKO
SATO KENICHIRO
Application Number:
JP2001159060A
Publication Date:
December 04, 2002
Filing Date:
May 28, 2001
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/004; C08F20/12; C08F32/08; H01L21/027; (IPC1-7): G03F7/004; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri (4 outside)