To provide a positive type resist formulation which indicate sufficient transmittivity when the light source of a laser light whose wavelength is 160nm or less, concretely, an F2 excimer laser light (157nm) is used and which is excellent in selectivity and a contrast.
The positive type resist composition contains resin which contains recursive units of specific structure and whose mass average molecular weight (polystyrene conversion) is 3,000 to 5,000 and whose coefficient of variation is 1.7 or less and in which a percentage in which a molecular weight is 1,000 or less is below 10 mass % by recursive units to be used and the percentage of monomers which remain is below 5 mass % and which is decomposed by working of acid and its solubility to alkaline developing solution increases.
MIZUTANI KAZUYOSHI
KANNA SHINICHI
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Yuriko Kuriu