Title:
イオン源内に発生したプラズマ中のイオンを検出するためのプローブアセンブリ
Document Type and Number:
Japanese Patent JP2004513478
Kind Code:
A
Abstract:
A method and apparatus relating to an ion implantation system that employs an ion source for generating a plasma having an ion, and a probe assembly for detecting the ion of the plasma is provided. The probe assembly includes a probe body and a focusing device for extracting the ion from the plasma, and a filter for filtering ions extracted from the plasma.
Inventors:
Victor Maurice Ben Benister
Application Number:
JP2002540179A
Publication Date:
April 30, 2004
Filing Date:
October 24, 2001
Export Citation:
Assignee:
Axcelis Technologies, Inc.
International Classes:
H01J27/02; H01J37/08; H01J37/32; (IPC1-7): H01J27/02; H01J37/08
Attorney, Agent or Firm:
Calyx
Miyazaki Yoshio
Kaoru Onozuka
Miyazaki Yoshio
Kaoru Onozuka