Title:
PROCESS FOR TREATING SYNTHETIC SILICA POWDER AND SYNTHETIC SILICA POWDER TREATED BY THE SAME
Document Type and Number:
Japanese Patent JP2006188412
Kind Code:
A
Abstract:
To provide an economical and efficient process to reduce bubble density and improve bubble stability in a crucible by controlling impurity levels in a synthetic silica powder feed material.
The process for producing a synthetic quartz glass powder which is substantially free of carbon contaminant is provided for the purpose of attaining reduced bubble density and improved stability of an article made from the synthetic quartz glass during fusion molding. In the process, the synthetic silica powder is maintained in an oxidizing environment, e.g. an atmosphere comprising at least 3 vol.% ozone at a temperature of lower than 1400°C, so as to reduce the content of carbon-containing compounds to less than 10 ppm.
Inventors:
RICHARD L HANSEN
KIRCHER THEODORE P
KORWIN DOUGLAS M
KIRCHER THEODORE P
KORWIN DOUGLAS M
Application Number:
JP2005341401A
Publication Date:
July 20, 2006
Filing Date:
November 28, 2005
Export Citation:
Assignee:
GEN ELECTRIC
International Classes:
C03B20/00
Domestic Patent References:
| JPH08301615A | 1996-11-19 | |||
| JPH08301614A | 1996-11-19 | |||
| JPH11139835A | 1999-05-25 | |||
| JPH02221111A | 1990-09-04 | |||
| JPH08301615A | 1996-11-19 | |||
| JPH08301614A | 1996-11-19 | |||
| JPH11139835A | 1999-05-25 | |||
| JPH02221111A | 1990-09-04 |
Attorney, Agent or Firm:
Kenichi Matsumoto
Hirokazu Ogura
Toshihisa Kurokawa
Hirokazu Ogura
Toshihisa Kurokawa
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