Title:
PRODUCTION OF PHENOL RESIN MODIFIED WITH NAPHTHOL
Document Type and Number:
Japanese Patent JP3149609
Kind Code:
B2
Abstract:
PURPOSE: To obtain a resin useful as a curing agent for epoxy resins, having excellent heat resistance and water-vapor resistance by mixing a phenol resin with a naphthol and a phenol and carrying out concentration under reduced pressure and/or steam distillation under a specific condition.
CONSTITUTION: This resin is obtained by reacting (A) a phenol resin (preferably a cresol novolak resin or a cresol naphthol cocondensation resin) obtained by reaction between a phenol and an aldehyde with (B) a naphthol (preferably 1-naphthol, 2naphthol or their mixture) and (C) a phenol (e.g. phenol or cresol) at 120-180°C under normal pressure for 1-12 hours and then carrying out concentration under reduced pressure and/or steam distillation at 140-230°C. The amounts of the components B and C are 20-200 pts.wt. based on 100 pts.wt. of the component A, respectively and the weight ratio of the component B/the component C is ≥0.2 to preferably carry out the reaction.
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Inventors:
Haruaki Sue
Shinsuke Hagiwara
Hiroyuki Saito
Shinsuke Hagiwara
Hiroyuki Saito
Application Number:
JP6238193A
Publication Date:
March 26, 2001
Filing Date:
March 23, 1993
Export Citation:
Assignee:
Hitachi Chemical Co., Ltd.
International Classes:
C08G8/28; (IPC1-7): C08G8/28
Domestic Patent References:
| JP4189812A | ||||
| JP3163128A |
Attorney, Agent or Firm:
Kunihiko Wakabayashi