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Title:
PRODUCTION OF POLY(IMIDE-SILOXANE) AND PRODUCTION OF COAT, FILM, COATING AND GAS-SEPARATION FILM
Document Type and Number:
Japanese Patent JPH03115433
Kind Code:
A
Abstract:

PURPOSE: To obtain the title polymer within a short time in high reactivity without generating side reaction by a relatively simple method reacting N,N'- dialkenyldiimide and a specific organosilicon compd. in the presence of a specific catalyst.

CONSTITUTION: N,N'-dialkenyldiimide (e.g. N,N'-diallylpyromellitic diimide) and an organosilicon compd. having two Si-bonded hydrogen atoms (e.g. compds. represented by formulae I, II) are reacted in the presence of a catalyst [L.PtCl2 (L is cyclic di- or polyolefin, especially, dicyclopentadiene platinum dichloride) is pref. because has high acting effect] accelerating the addition of Si-bonded hydrogen atoms to an aliphatic multiple bond. Poly(imide-siloxane) can be produced by a relatively simple method without generating non-pref. side reaction and high reactivity can be achieved within a short reaction time.


Inventors:
GUIDO BUENSUKI
RUUTOBUIHI MAIAA
FURANTSUUHAINRITSUHI KUROITSUA
Application Number:
JP20234090A
Publication Date:
May 16, 1991
Filing Date:
July 30, 1990
Export Citation:
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Assignee:
CONSORTIUM ELEKTROCHEM IND
International Classes:
B01D71/64; B01D71/70; C08G73/10; C08G77/42; C08G77/455; C08G77/54; C08G77/60; C08J5/18; (IPC1-7): B01D71/64; B01D71/70; C08G73/10; C08G77/455; C08G77/54; C08G77/60; C08J5/18
Domestic Patent References:
JPS57143328A1982-09-04
Attorney, Agent or Firm:
Toshio Yano (2 outside)