Title:
PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, EXPOSURE METHOD, AND METHOD OF MANUFACTURING MICRO DEVICE
Document Type and Number:
Japanese Patent JP2004006783
Kind Code:
A
Abstract:
To provide a projection optical system which restricts a local flare within a tolerance.
In a projection optical system PL, an image of a pattern on a first plane R is formed on a second plane W by employing exposure light in a wavelength region shorter than 200 nm. In the case that a projection pattern having a dark pattern disposed on the first plane R and a bright pattern formed surrounding the dark pattern is projected to the second plane, when the illuminance of an image of the bright pattern formed on the second plane W is 100, a mean value of the illuminance in a region of an image of the dark pattern formed on the second plane W is 8 or less.
Inventors:
SUZUKI GOJI
KOMATSUDA HIDEKI
KIMURA YASUHIRO
KOMATSUDA HIDEKI
KIMURA YASUHIRO
Application Number:
JP2003100090A
Publication Date:
January 08, 2004
Filing Date:
April 03, 2003
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03B27/48; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Attorney, Agent or Firm:
Yoshihiro Fujimoto