Title:
Real time analysis of the periodic structure in a semiconductor
Document Type and Number:
Japanese Patent JP5991960
Kind Code:
B2
Abstract:
A system for characterizing geometric structures formed on a sample on a real time basis is disclosed. A multi-parameter measurement module generates output signals as a function of either wavelength or angle of incidence. The output signals are supplied to a parallel processor. The processor creates an initial theoretical model and then calculates the theoretical optical response of that sample. The calculated optical response is compared to measured values. Based on the comparison, the model configuration is modified to be closer to the actual measured structure. The processor recalculates the optical response of the modified model and compares the result to the measured data. This process is repeated in an iterative manner until a best fit is achieved. The steps of calculating the optical response of the model is distributed to the processors as a function of wavelength or angle of incidence so these calculations can be performed in parallel.
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Inventors:
Opsal, John
Chew, hanyou
Chew, hanyou
Application Number:
JP2013267269A
Publication Date:
September 14, 2016
Filing Date:
December 25, 2013
Export Citation:
Assignee:
KLA-Tenker Corporation
International Classes:
G01B11/02; G01B11/24; G01N21/21; G01N21/27; G01N21/47; G03F7/20; G06F17/00; H01L21/027; H01L21/66
Domestic Patent References:
| JP2059604A |
Foreign References:
| US5963329 |
Other References:
John M. Jarem,A Rigorous Coupled-Wave Analysis and Crossed-Diffraction Grating Analysis of Radiation and Scattering from Three-Dimensional Inhomogeneous Objects,IEEE TRANSACTIONS ON ANTENNAS AND PROPAGATION,米国,1998年 5月,VOL. 46, NO. 5,p.740~741
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office