Title:
多成分流体用のリアル・タイム成分モニタリングおよび補充システム
Document Type and Number:
Japanese Patent JP2005508079
Kind Code:
A
Abstract:
A multicomponent fluid composition monitoring and compositional control system, in which a component analysis is effected by titration or other analytical procedure, for one or more components of interest, and a computational means then is employed to determine and responsively adjust the relative amount or proportion of the one or more components in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition. The system is usefully employed in semiconductor manufacturing photoresist and post-etch residue removal, in which the cleaning medium is a semi-aqueous solvent composition, and water is the monitored and responsively adjusted component.
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Inventors:
Stevens, Russell
Crowf Fasstain, Thomas
Icock, Todd
Ivans, Joseph, W.
Crowf Fasstain, Thomas
Icock, Todd
Ivans, Joseph, W.
Application Number:
JP2003540608A
Publication Date:
March 24, 2005
Filing Date:
October 04, 2002
Export Citation:
Assignee:
Advanced Technology Materials Incorporated
International Classes:
G03F7/42; G05D11/13; G05D21/02; H01L21/00; H01L21/027; H01L21/304; H01L21/306; (IPC1-7): H01L21/027; G03F7/42; H01L21/304; H01L21/306
Attorney, Agent or Firm:
Yoshiyuki Inaba
Katsuro Tanaka
Shinji Oga
Katsuro Tanaka
Shinji Oga