Title:
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023101395
Kind Code:
A
Abstract:
To provide a salt, a resin, and a resist composition which allow a resist pattern having good line edge roughness to be produced.SOLUTION: The resist composition contains: an acid generator containing a salt represented by formula (I); and a resin containing a structural unit represented by formula (a2-A) and a structural unit having an acid-labile group. [In the formula (I), R1, R2, R3 and R4 each represent a halogen atom, a haloalkyl group or the like; m3 and m4 represent integers of 0-4; and A- represents an organic anion.]SELECTED DRAWING: None
Inventors:
ADACHI YUKAKO
IKEDA HIDEAKI
ICHIKAWA KOJI
IKEDA HIDEAKI
ICHIKAWA KOJI
Application Number:
JP2022211526A
Publication Date:
July 20, 2023
Filing Date:
December 28, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C25/18; C07C309/17; C07D321/10; C08F12/24; C08F20/10; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP