Title:
レジスト組成物、及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP5690952
Kind Code:
B2
Abstract:
A compound represented by general formula (I); and a compound represented by general formula (b1-1)
.[Chemical Formula 1]
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ X-Q 1 -Y 1 -SO - 3 M + €ƒ€ƒ€ƒ€ƒ€ƒ(1)
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ X-Q 1 -Y 1 -SO - 3 A + €ƒ€ƒ€ƒ€ƒ€ƒ(b1 - 1)
wherein Q 1 represents a divalent linkage group or a single bond; Y 1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an -SO 2 - bond in the structure thereof; M + represents an alkali metal ion; and A + represents an organic cation.
Inventors:
瀬下 武広
内海 義之
川上 晃也
羽田 英夫
清水 宏明
中村 剛
内海 義之
川上 晃也
羽田 英夫
清水 宏明
中村 剛
Application Number:
JP2014001274A
Publication Date:
March 25, 2015
Filing Date:
January 07, 2014
Export Citation:
Assignee:
東京応化工業株式会社
International Classes:
G03F7/004; C07D327/04; C08F2/50; C08F220/10; C08F220/28; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Mitsuyoshi Suzuki
Igarashi Mitsunaga
Masatake Shiga
Mitsuyoshi Suzuki
Igarashi Mitsunaga