レジスト組成物及びレジストパターン形成方法、並びに、化合物及び酸発生剤

Japanese Patent JP7094144

B2

To provide a novel compound useful as an acid generator for a resist composition, an acid generator using the compound, a resist composition containing the acid generator, and a resist pattern forming method using the resist composition.SOLUTION: The resist composition contains a compound represented by general formula (bd1) and comprising an anionic moiety and a cationic moiety. In the formula (bd1), Rx-Rxeach represent a hydrocarbon group or a hydrogen atom or may be bonded to each other to form a ring structure; Ry-Ryeach represent a hydrocarbon group or a hydrogen atom or may be bonded to each other to form a ring structure; Rz-Rzeach represent a hydrocarbon group or a hydrogen atom or may be bonded to each other to form a ring structure; at least one of Rx-Rx, Ry-Ryand Rz-Rzhas an anionic group; and Mrepresents an organic cation having an electron-withdrawing group.SELECTED DRAWING: None

JP7244795	Composition for forming monomolecular layer or polymolecular layer, monomolecular layer or polymolecular layer, laminate, and method for producing substrate
JP2006231731	LITHOGRAPHIC PRINTING PLATE MATERIAL, LITHOGRAPHIC PRINTING PLATE AND PRINTING METHOD USING IT
JP2003287882	PHOTOSENSITIVE MATERIAL AND METHOD FOR MAKING PLANOGRAPHIC PRINTING PLATE

Masatoshi Arai
Komuro Yoshitaka

JP2018101872A

July 01, 2022

May 28, 2018

Click for automatic bibliography generation  

Tokyo Ohka Kogyo Co., Ltd.

G03F7/004; C07C57/50; C07C309/12; C07C309/24; C07C381/12; C07D307/00; G03F7/039; G03F7/20

JP2012003249A
JP2010250063A

Sumio Tanai
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida

Previous Patent: Data processing equipment, measurement systems and data processing programs

Next Patent: Resist composition and resist pattern forming method